Alfred Driessen, University of Twente, The Netherlands
Anders Bjarklev, Technical University of Denmark, Denmark
Andreas Rasch, LITEF GmbH, Germany
Chris Doerr, Lucent Technologies, USA
Christi Madsen, Texas A&M University, USA
Christian Lerminiaux, University of Technology of Troyes, France
David Yevick, University of Waterloo, Canada
Denis Barbier, Teem Photonics, France
Ed Murphy, JDS Uniphase, USA
Edgar Voges, University of Dortmund, Germany
Edwin Pun, City University of Hong Kong, Hong Kong
Fernando Cussó, University of Madrid, Spain
Gunnar Arvidsson, Acreo AB, Sweden
Henri Porte, PHOTLINE Technologies, France
Ian White, University of Cambridge, UK
Ivo Montrosset, Polytecnico di Torino, Italy
James Wilkinson, University of Southampton, UK
Jiří Ctyroký, Institute of Photonics & Electronics AS CR, Czech Republic
John Marsh, Intense Photonics, UK
Karin Ennser, Swansea University, UK
Marc De Micheli, CNRS - University of Nice Sophia Antipolis, France
Marc Sorel, University of Glasgow, UK
Martin Schell, Heinrich-Hertz-Institut, Germany
Meint Smit, Technical University of Eindhoven, The Netherlands
Mogens Rysholt Poulsen, Technical University of Denmark, Denmark
Olav Gaute Hellesø, University of Tromsø, Norway
Olivier Parriaux, University of St-Etienne, France
Reinhard März, JCMwave GmbH, Germany
Reinhold Pregla, University of Hagen, Germany
Roel Baets, Ghent Univeristy - IMEC, Belgium
Serge Valette, CEA-LITEN, France
Sheila Galt, Chalmers University of Technology, Sweden
Stefano Taccheo, Polytecnico di Milano, Italy
Tomasz R. Wolinski, Warsaw University of Technology, Poland
Toshiaki Suhara, Osaka University, Japan
Valerio Pruneri, The Institute of Photonic Sciences and ICREA, Spain
Vladimir Sychugov, General Physics Institute, Russia
Wolfgang Sohler, University of Paderborn, Germany
Yoshiaki Nakano, The University of Tokyo, Japan
Yuri Korkishko, Optolink, Russia
Yaakov Achiam, CeLight, USA